Job Abstract

As part of the uncooled detector (focal plane array) research and development team, the successful candidate will have responsibility for engineering wafer fab processes including DUV lithography using ASML 5500, plasma and reactive ion etch, thin film deposition, and wet cleans for next generation infrared detector designs. Candidate will design and implement new processes and automate or improve existing ones to support aggressive technology development goals. Candidate will characterize wafer... more details

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